Maskless 2D/3D lithography with nanoscale resolution
Ultra-high-speed processing for industrial purpose empowered by patented technology
Minimal stitching error
Compatible with up to 12-inch substrate
Fully automatic system
Additive and subtractive 2D/3D manufacturing
Multifunctional system designed for polymer, glass, metal and alloy
Nanoscale resolution and precision
Fully automatic operation
Compact but fully-equipped design
3D lithography with 120 nm linewidth
Various materials
One-click rapid prototyping for research purposes
Up to 300 nm resolution
Smooth edge and minimal stitching error
Up to 300 mm²/min