Maskless 2D/3D lithography with nanoscale resolution

Ultra-high-speed processing for industrial purpose empowered by patented technology

Minimal stitching error

Compatible with up to 12-inch substrate

Fully automatic system

Additive and subtractive 2D/3D manufacturing

Multifunctional system designed for polymer, glass, metal and alloy

Nanoscale resolution and precision

Fully automatic operation

Compact but fully-equipped design

3D lithography with 120 nm linewidth

Various materials

One-click rapid prototyping for research purposes

Up to 300 nm resolution

Smooth edge and minimal stitching error

Up to 300 mm²/min