Service Hotline:+86-0535-2981985 Moji-Nano
Service Hotline:+86-0535-2981985
Based on UV lithography, the MN-UV-Smart lithography system combines SLM maskless printing technologies, making it the optimal tool for rapid prototyping and wafer-scale batch processing of virtually any 2D and 2.5D structures.
The compact and integrated design, fully automatic control, powerful and user-friendly workflow, high writing speed, and high resolution make it suitable for rapid prototyping and small batch production, with applications in microfluidics, semiconductors, biomedical engineering, and microelectronics.
Write mode |
Nano |
Standard |
X |
Minimum feature size |
0.3 µm |
1 µm |
4 µm |
Minimum lines and spaces |
0.45 µm |
1 µm |
5 µm |
Global 2nd layer alignment [3σ, nm] |
0.5 µm |
0.5 µm |
1.0 µm |
Maximum write speed |
40 mm
2
/min |
900 mm
2
/min |
3000 mm
2
/min |
Light source |
405 nm/365 nm
| ||
Substrate sizes |
Variable: 50mm×50mm to 8''×8'' | Optional: 10'' × 10'' Customizable on request | ||
Substrate thickness | 0 -12 mm | ||
Maximum exposure area | 50x50mm
2
/100x100mm
2
/200x200mm
2(customized) | ||
Contact information
E-mail